The global Extreme Ultraviolet Lithography (EUVL) market size was USD 3.12 Billion in 2021 and is expected to register a revenue CAGR of 27.07% during the forecast period, according to the latest analysis by Emergen Research. The rising demand for Laser Produced Plasma (LPP) for light sourcing is projected to support market revenue growth between 2021 and 2030. To accelerate particles and produce brief x-ray bursts, laser-produced plasmas are used. In addition, they help simulate astronomical plasmas in laboratories. Molten tin droplets around 25 microns in diameter are blasted from a generator at 70 meters per second in an LPP source. The droplets are initially hit by a weak laser pulse as they descend, which gives them a pancake shape. The flattened droplet is then vaporized by a stronger laser pulse, forming a plasma that releases EUV light. This procedure is carried out 50,000 times per second in order to generate enough light to create microchips. LPP has high output power and Conversion Efficiency (CE), which makes them a promising alternative for EUVL sources. For example, the NXE:3400B EUV scanner setting CO2 LPP system from ASML is now deployed and in use by chipmaker customers.
The Worldwide Extreme Ultraviolet Lithography Market Report, distributed by Emergen Research, offers an industry-wide appraisal of the Extreme Ultraviolet Lithography market, which is comprehensive of the most pivotal elements adding to the development of the business. The most recent examination report includes a broad investigation of the miniature and full scale monetary pointers that impact the worldwide market.
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Competitive Terrain:
The global Extreme Ultraviolet Lithography industry is highly consolidated owing to the presence of renowned companies operating across several international and local segments of the market. These players dominate the industry in terms of their strong geographical reach and a large number of production facilities. The companies are intensely competitive against one another and excel in their individual technological capabilities, as well as product development, innovation, and product pricing strategies.
The leading market contenders listed in the report are:
ASML, Tokyo Electron Limited, Samsung, Taiwan Semiconductor Manufacturing Company, Intel Corporation, NTT Advanced Technology Corporation, Nikon Corporation, Toshiba Corporation, Toppan Inc., Canon Inc., and ZEISS International
Key market aspects studied in the report:
Market Scope: The report explains the scope of various commercial possibilities in the global Extreme Ultraviolet Lithography market over the upcoming years. The estimated revenue build-up over the forecast years has been included in the report. The report analyzes the key market segments and sub-segments and provides deep insights into the market to assist readers with the formulation of lucrative strategies for business expansion.
Competitive Outlook: The leading companies operating in the Extreme Ultraviolet Lithography market have been enumerated in this report. This section of the report lays emphasis on the geographical reach and production facilities of these companies. To get ahead of their rivals, the leading players are focusing more on offering products at competitive prices, according to our analysts.
Report Objective: The primary objective of this report is to provide the manufacturers, distributors, suppliers, and buyers engaged in this sector with access to a deeper and improved understanding of the global Extreme Ultraviolet Lithography market.
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Market Segmentations of the Extreme Ultraviolet Lithography Market
This market is segmented based on Types, Applications, and Regions. The growth of each segment provides accurate forecasts related to production and sales by Types and Applications, in terms of volume and value for the period between 2022 and 2030. This analysis can help readers looking to expand their business by targeting emerging and niche markets. Market share data is given on both global and regional levels. Regions covered in the report are North America, Europe, Asia Pacific, Latin America, and Middle East & Africa. Research analysts assess the market positions of the leading competitors and provide competitive analysis for each company. For this study, this report segments the global Extreme Ultraviolet Lithography market on the basis of product, application, and region:
Segments Covered in this report are:
Equipment Outlook (Revenue, USD Billion; 2019–2030)
- Light Source
- Mask
- Mirrors
- Others
End-Use Outlook (Revenue, USD Billion; 2019–2030)
- Integrated Device Manufacturers (IDMs)
- Foundry
- Others
Regional Outlook (Revenue, USD Billion; 2019–2030)
- North America
- U.S.
- Canada
- Mexico
- Europe
- Germany
- France
- U.K.
- Italy
- Spain
- Benelux
- Rest of Europe
- Asia Pacific
- China
- India
- Japan
- South Korea
- Rest of APAC
- Latin America
- Brazil
- Rest of LATAM
- Middle East & Africa
- Saudi Arabia
- UAE
- South Africa
- Turkey
- Rest of Middle East & Africa
- North America
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Major Geographies Analyzed in the Report:
- North America (U.S., Canada)
- Europe (U.K., Italy, Germany, France, Rest of EU)
- Asia Pacific (India, Japan, China, South Korea, Australia, Rest of APAC)
- Latin America (Chile, Brazil, Argentina, Rest of Latin America)
- Middle East & Africa (Saudi Arabia, U.A.E., South Africa, Rest of MEA)
ToC of the report:
Chapter 1: Market overview and scope
Chapter 2: Market outlook
Chapter 3: Impact analysis of COVID-19 pandemic
Chapter 4: Competitive Landscape
Chapter 5: Drivers, Constraints, Opportunities, Limitations
Chapter 6: Key manufacturers of the industry
Chapter 7: Regional analysis
Chapter 8: Market segmentation based on type applications
Chapter 9: Current and Future Trends
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